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copper deposited patterned porous BP2 self-assembled monolayer film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

gold

Type Single Compound
Formula Au
Role layer
2

copper

Type Single Compound
Formula Cu
Role partial layer
3

BP2 self-assembled monolayer

BP2 SAM
Type Nano Material
Formula
Role layer

Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Method Nanomaterial Variant Source
scanning tunneling microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. o10Qif4JDcOsZ4aV
  2. VGEcckKx1SoDBhMdla8PG20D7l5
  3. g41mMM0
  4. k7JwZN0
Product

copper deposited patterned porous BP2 self-assembled monolayer film

Diameter: ~ 80 - ~ 100 nm

Hole diameter: ~ 10 nm

Periodicity: ~ 160 nm

Thickness: 300 nm

Medium: none

Support: mica

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. 0jyHklsLVIWoM9WN
  2. i0jbBRvSitEIGIQG59L1KqvU36a
  3. RnWeDYp
  4. FjvTSXi
Product

copper deposited patterned porous BP2 self-assembled monolayer film

Diameter: ~ 30 - ~ 50 nm

Hole diameter: 4 - 10 nm

Periodicity: ~ 50 nm

Thickness: 300 nm

Medium: none

Support: mica

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. uk71dKiRgE7Oxk0s
  2. QjjmU0gvKua5cMBMorpk4XGcEiT
  3. h7YF4sy
  4. EOFNX9L
Product

copper deposited patterned porous BP2 self-assembled monolayer film

Diameter: ~ 10 - ~ 25 nm

Hole diameter: 4 - 10 nm

Periodicity: ~ 50 nm

Thickness: 300 nm

Medium: none

Support: mica

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. hq9cV01kalXbUu0b
  2. Bif5oc2ohHb745eNKJ1HurR1l86
  3. e69y0Ko
  4. d3xvlu
Product

copper deposited patterned porous BP2 self-assembled monolayer film

Diameter: 12 - 20 nm

Hole diameter: 6 nm

Periodicity: ~ 50 nm

Thickness: 300 nm

Medium: none

Support: mica

References

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