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ITO thin film

Based on

11 Articles
1 Patents
2017 Most recent source

Composition

1

tin-doped indium oxide nanoparticles

ITO nanoparticles
Type Nano Material
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
capacitance

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Product

ITO thin film

Ridge height: 338 - 362 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Product

ITO thin film

Hole depth: ~ 355 nm

Hole pitch: ~ 340 nm

Hole radius: ~ 125 nm

Hole wall thickness: ~ 90 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
  1. OHDL6Q
  2. ZNw
Product

ITO thin film

Hole depth: ~ 340 nm

Hole pitch: ~ 340 nm

Hole radius: ~ 125 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Product

ITO thin film

Ridge height: ~ 380 nm

Ridge pitch: ~ 450 nm

Ridge width at base: ~ 130 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Product

ITO thin film

Size: not specified

Medium: none

Support: quartz

References

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