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phosphorus-doped microcrystalline silicon thin film

Based on

1 Articles
2013 Most recent source

Composition

1

crystalline silicon

c-Si cSi
Type Single Compound
Formula Si
Role raw materials
2

amorphous silicon

amorphous Si a-Si:H a-Si aSi
Type Single Compound
Formula Si
Role raw materials
3

phosphorus

Type Single Compound
Formula P
Role dopant

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electrical conductivity

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • quartz
  • phosphorus-doped silicon
  1. F3doapFp5thYHORtJ
  2. OCiWdzOGwBPvZdFgfEhOaOvwC
  3. 2J4si9TTZeOS1TEXZlURSwF6N6v3Lf
  4. H8QgAOMi0SgzkZs9RTe3ieC
  5. Vs8jaq
Product

phosphorus-doped microcrystalline silicon thin film

Thickness: 45 nm

Medium: none

Support: quartz

Method 2

Type: Physical formation
Source:
Starting materials
  • quartz
  • phosphorus-doped silicon
  1. cnLpDr2o3MGWUAte2
  2. FTVmp9eu0W2wiepwVdMDoJQuQ
  3. 359fBTfJtOWolBt3PcwVvEZrr24KE7
  4. bYhhNSj0cfJqVB8xZmfYzWx
  5. QTGxAz
Product

phosphorus-doped microcrystalline silicon thin film

Thickness: 45 nm

Medium: none

Support: quartz

Method 3

Type: Physical formation
Source:
Starting materials
  • boron-doped silicon
  • quartz
  1. rCe55MiVnxETqsc4N
  2. 8t4k8W9iPQbGUki217RlZdZRi
  3. tWPeXaKoyX8Pr0BqIwILatj2HITE83
  4. UKxNBHVBVDKWlfqSv41ZyIt
  5. ZYAYc2
Product

phosphorus-doped microcrystalline silicon thin film

Thickness: 45 nm

Medium: none

Support: quartz

Method 4

Type: Physical formation
Source:
Starting materials
  • boron-doped silicon
  • quartz
  1. RDYw9rTJp6vOrB5ld
  2. n3gJndLmYmKYg1Ndf47KGcIyU
  3. EiPaZbsCqgA56os5W9l4Z0EhV1iykt
  4. wa2lx2Jt8di5Fs1IywaOujv
  5. 3nrAYP
Product

phosphorus-doped microcrystalline silicon thin film

Thickness: 45 nm

Medium: none

Support: quartz

References

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