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triethylsulfonium bis(trifluoromethylsulfonyl)imide/fumed silica gel

Based on

1 Patents
2013 Most recent source

Composition

1

triethylhexylammonium bis(trifluoromethylsulfonyl)imide

triethylhexylammonium bis(trifluoromethylsulfonyl)imide
Type Single Compound
Formula C14H28F6N2O4S2
Role binder
2

fumed silica

fumed SiO2
Type Nano Material
Formula
Role fillers

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
electrolyte performance

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Applications

Area Application Nanomaterial Variant Source
electrodes/electrolytes

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • fumed silica
  • butyltrimethylammonium bis(trifluoromethylsulfonyl)imide
Product

triethylsulfonium bis(trifluoromethylsulfonyl)imide/fumed silica gel

Size: not specified

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • fumed silica
  • triethylsulfonium bis(trifluoromethylsulfonyl)imide
Product

triethylsulfonium bis(trifluoromethylsulfonyl)imide/fumed silica gel

Size: not specified

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • fumed silica
  • triethylsulfonium bis(trifluoromethylsulfonyl)imide
Product

triethylsulfonium bis(trifluoromethylsulfonyl)imide/fumed silica gel

Size: not specified

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • fumed silica
  • triethylhexylammonium bis(trifluoromethylsulfonyl)imide
Product

triethylsulfonium bis(trifluoromethylsulfonyl)imide/fumed silica gel

Size: not specified

Medium/Support: none

References

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