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one-dimensional grating pattern nanostructures on positive photoresist-coated Si wafer

Based on

1 Articles
2013 Most recent source

Composition

1

positive photoresist DHK-BF424

Type Complex Compound
Formula
Role raw materials

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
  • positive photoresist DHK-BF424
Product

one-dimensional grating pattern nanostructures on positive photoresist-coated Si wafer

Periodicity: 660 nm

Size: 305 nm

Medium: none

Support: silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon
  • positive photoresist DHK-BF424
Product

one-dimensional grating pattern nanostructures on positive photoresist-coated Si wafer

Periodicity: 653 nm

Size: 313 nm

Medium: none

Support: silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon
  • positive photoresist DHK-BF424
Product

one-dimensional grating pattern nanostructures on positive photoresist-coated Si wafer

Periodicity: ~ 650 nm

Size: ~ 300 nm

Medium: none

Support: silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon
  • positive photoresist DHK-BF424
Product

one-dimensional grating pattern nanostructures on positive photoresist-coated Si wafer

Periodicity: 649 nm

Size: 307 nm

Medium: none

Support: silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • silicon
  • positive photoresist DHK-BF424
Product

one-dimensional grating pattern nanostructures on positive photoresist-coated Si wafer

Periodicity: 655 nm

Size: 301 nm

Medium: none

Support: silicon

References

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