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antimony-doped tin oxide thin film

Based on

6 Articles
1 Patents
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

indium tin oxide

ITO
Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
charge carrier density

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Applications

Area Application Nanomaterial Variant Source
electronic paper

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
  1. cCVjpgmBtb3vaXabIgHTFw
Product

antimony-doped tin oxide thin film

Pore size: 10 - 20 nm

Thickness: 60 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
  1. wjpCIayNEKLYlmgDaCKQoT
Product

antimony-doped tin oxide thin film

Pore size: 10 - 20 nm

Thickness: 60 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
  1. dGj4om1kYf6HnGpYvaTpYs
Product

antimony-doped tin oxide thin film

Pore size: 10 - 20 nm

Thickness: 50 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
  1. HWw8ZwYPFC2f7Y2EIRcD54
Product

antimony-doped tin oxide thin film

Pore size: 10 - 20 nm

Thickness: 50 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  • magnesium tin oxide
  1. 6NirX7
Product

antimony-doped tin oxide thin film

Thickness: ~ 50 nm

Medium/Support: none

References

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