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hole array-perforated silicon membrane

Based on

130 Articles
4 Patents
2018 Most recent source

Composition

1

crystalline silicon

c-Si cSi
Type Single Compound
Formula Si
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
absolute efficiency dependent on wavelength

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Applications

Area Application Nanomaterial Variant Source
electronics

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energy storage
optoelectronics
photonics
power generation
raw materials/precursors/templates

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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field emission scanning electron microscopy
Raman spectroscopy
scanning electron microscopy
transmission electron microscopy
UV
UV-Vis-NIR optical spectroscopy
X-ray diffraction

Biological effects

Biological system Test details Nanomaterial Variant Source
male Sprague-Dawley rat

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
  1. pjNuFtRBx0Oyu0RLdl
Product

hole array-perforated silicon membrane

Mesa width: 130 - 180 nm

Trench depth: ~ 45 nm

Trench width: 220 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  1. ekK1AokdszWv1wae87AWMMvAvrBiMAflvN
Product

hole array-perforated silicon membrane

Trench depth: ~ 0.55 - ~ 1.1 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon
  1. z5l3qK8
Product

hole array-perforated silicon membrane

Groove depth: 200 nm

Groove spacing: 300 nm

Groove width: 200 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  1. P3CyUNiQDvzdtX7XlY6rbM9StvNR4GBZKJ
Product

hole array-perforated silicon membrane

Trench depth: ~ 5.5 - ~ 6.0 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  1. o4gAE0AFuQLz4uTyCYWfW75J7gPOdtXP2y
Product

hole array-perforated silicon membrane

Trench depth: 4.63 nm

Trench width: 74.4 nm

Medium/Support: none

References

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