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hole array-perforated silicon membrane

Based on

135 Articles
4 Patents
2018 Most recent source

Composition

1

silicon

Type Single Compound
Formula Si
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
absolute efficiency dependent on wavelength

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Applications

Area Application Nanomaterial Variant Source
electronics

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energy storage
optoelectronics
photonics
power generation
raw materials/precursors/templates

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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field emission scanning electron microscopy
Raman spectroscopy
scanning electron microscopy
transmission electron microscopy
UV
UV-Vis-NIR optical spectroscopy
X-ray diffraction

Biological effects

Biological system Test details Nanomaterial Variant Source
male Sprague-Dawley rat

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  1. Xewr2uVILCGKOaTizLY4OnKxPjQ6wxrcg7
Product

hole array-perforated silicon membrane

Trench depth: ~ 1.65 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon
  1. bvfbXNf8G9UrNIIUV9
Product

hole array-perforated silicon membrane

Dent depth: ~ 45 nm

Dent length: 200 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • silicon
  1. 8dTZiNE
Product

hole array-perforated silicon membrane

Groove depth: 200 nm

Groove spacing: 300 nm

Groove width: 200 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  1. ixZXozLlHdlaFxSLYoCekDTPQ5avkhdnLn
Product

hole array-perforated silicon membrane

Trench depth: 4.63 nm

Trench width: 74.4 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  • silicon
  1. UpwFpwdh2aHBVK9Et9XG
Product

hole array-perforated silicon membrane

Slit depth: 100 nm

Medium/Support: none

References

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