Loading ...

a-Si : H thin film

Based on

3 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

n-type hydrogenated amorphous silicon

n-type a-Si:H (n) a-Si:H
Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
current distribution

More information available to subscribers only.

Or, view sample content

Applications

Area Application Nanomaterial Variant Source
raw materials/precursors/templates

More information available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

More information available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • a-Si : H
  1. A9TJwwN19wPNPserfGVG9n0ozDqreDJuFDlQJxtNk0FEHKn3rK8e52fdQHOQM2WiCyR4TjS6pemaNmczxPliOZqeA0LIlpZwiaWKjBhagWP7b81v0Qq3KcrpyX2j2kaLoe
  2. tOzkk7szzp8aOGhTA4dIFNpqGrRrcT0r8Uf
Product

a-Si : H thin film

Thickness: 13.8 - 16.2 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • a-Si : H
  1. NlFvKasyzksjOyKvKHWcosJlRxvfz4jt7HsHNxLLXZm7Vg7G4lczXHRM5JLUiaVPTyO3CXhPh3JGcHw1uj15VpR2nM5C7D8jAofGS0bugcl0ti77EHTWEzg6X8tOhfj2HG
  2. lCaLP1yrimYSV0p8IE8OFuO0zaDQXMQyqLg
Product

a-Si : H thin film

Thickness: 10 - 30 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • silicon hydride
  1. hYQTuWLVN8duaybXS
  2. xcSHBPzERPAYaDJb6IzDrn0i9z
Product

a-Si : H thin film

Pit depth: 40 - 175 nm

Pit diameter: 300 nm

Thickness: 140 - 200 nm

Medium/Support: none

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial