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SiO2 film

Based on

372 Articles
21 Patents
2018 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
Porosity

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refractive index
water contact angle

Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for hepcidin in human serum

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Applications

Area Application Nanomaterial Variant Source
coatings

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electronics
raw materials/precursors/templates

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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field emission scanning electron microscopy
other
scanning electron microscopy
transmission electron microscopy
UV
UV-Vis spectroscopy
X-ray photoelectron spectroscopy

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. PeWBMxHgiIWAjTvUx2LHt
Product

SiO2 film

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. WZWZLIFema81QwYZ0RtYua4ahlUkyZ1qfKya
  2. dTIuW2DyrXtUU1XEu8wpq
Product

SiO2 film

Thickness: 100 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. AYcpsjDnKAXgZtJV7UlF7G4HIhnN1OWXv9J3
  2. 8nxoaDUErkAG0fEXQufd0
Product

SiO2 film

Thickness: 100 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicon hydride
  1. k9177
Product

SiO2 film

Thickness: 2 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • bis(diethylamino)silane
  1. ujpSaT
  2. dQf
  3. FjwhpGi8FEFgpBJmbk5GiWQIisGnUk4sbUiW31WXodVUph6UIPYcn
Product

SiO2 film

Thickness: ~ 1 nm

Medium/Support: none

References

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