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Based on

383 Articles
21 Patents
2018 Most recent source

Composition

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
porosity

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refractive index
water contact angle

Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for hepcidin in human serum

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Applications

Area Application Nanomaterial Variant Source
coatings

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electronics
raw materials/precursors/templates

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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field emission scanning electron microscopy
other
scanning electron microscopy
transmission electron microscopy
UV
UV-Vis spectroscopy
X-ray photoelectron spectroscopy

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicon hydride
  1. xRWJ9
Product

SiO2 film

Thickness: 2 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. 1punuiMsUZ4t7fdIx7JD6aEGyUnWnnJkvi3V
  2. XL1vF89BdCvEqQu6cs1Ot
Product

SiO2 film

Thickness: 100 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. HXBhN8CSQGHX5SP9wU8nd4zhL9CFpm3whj3R
  2. PxTdSPvTWsz3lqkrNXUjZ
Product

SiO2 film

Thickness: 100 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • silicon tetrachloride
  1. OUHZhnkmZ7m
  2. 59rJKqL2f2deNRw6xj
Product

SiO2 film

Wall thickness: ~45 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • water
  • silicic acid tetraethyl ester
  1. Dngik77V2aADFSsYKgCZ6
Product

SiO2 film

Thickness: 100 nm

Medium/Support: none

References

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