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SiNW

Based on

26 Articles
2 Patents
2017 Most recent source

Composition

1

crystalline silicon

c-Si cSi
Type Single Compound
Formula Si
Role core
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
barrier height for conduction electrons

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Applications

Area Application Nanomaterial Variant Source
diagnostics

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Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. ZHCmUJ
Product

SiNW

Diameter: ~ 70 nm

Length: 50000 nm

Spacing: 2000 nm

Medium: none

Support: soda-lime-silica glass

Method 2

Type: Chemical synthesis
Source:
  1. GfMy0v
  2. 5lnjR8VyP8jM1Uk
Product

SiNW

Diameter: ~ 60 nm

Spacing: 2000 nm

Medium: none

Support: soda-lime-silica glass

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • highly doped p-type silicon wafer
  1. X387RS9
  2. kcZ1tjHVaBChX9T
Product

SiNW

Pore spacing: 2.8 - 5.8 nm

Thickness: ~ 1 - ~ 2 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • single crystalline silicon
  1. Qqcjs9ixnSXYHN0k
Product

SiNW

Thickness: ~ 20 - 25 nm

Medium: none

Support: single crystalline silicon

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • single crystalline silicon
  1. 3SJYtprCIuzZ7Fd2
Product

SiNW

Thickness: 20 nm

Medium: none

Support: silicon/silica

References

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