Loading ...

SiNW

Based on

27 Articles
1 Patents
2017 Most recent source

Composition

1

Vacuous

Type
Formula
Role core
2

silicon

Type Single Compound
Formula Si
Role layer
3

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
barrier height for conduction electrons

More information/entries available to subscribers only.

Or, view sample content

Applications

Area Application Nanomaterial Variant Source
diagnostics

More information/entries available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
scanning electron microscopy

More information/entries available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Chemical synthesis
Source:
  1. PEqIqC
  2. jfZde9lXrfBoCaf
Product

SiNW

Diameter: ~ 60 nm

Spacing: 2000 nm

Medium: none

Support: soda-lime-silica glass

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • highly doped p-type silicon wafer
  1. yU9BU9y
  2. PjwpQmVm0YXp46I
Product

SiNW

Pore spacing: 2.8 - 5.8 nm

Thickness: ~ 1 - ~ 2 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. N46vni
Product

SiNW

Diameter: ~ 70 nm

Length: 50000 nm

Spacing: 2000 nm

Medium: none

Support: soda-lime-silica glass

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • single crystalline silicon
  1. MuOg5IqXRJ11vy6N
Product

SiNW

Thickness: 20 nm

Medium: none

Support: silicon/silica

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • single crystalline silicon
  1. RKSYT7M4wAFx53R8
Product

SiNW

Thickness: ~ 20 - 25 nm

Medium: none

Support: single crystalline silicon

References

Full content is available to subscribers only

To view content please choose from the following:


Sign up for a free trial