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annealed Cu/Ta/Si stack

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

copper silicide

Type Single Compound
Formula Cu3Si
Role layer
2

tantalum

Type Single Compound
Formula Ta
Role layer
3

copper

Type Single Compound
Formula Cu
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
activation energy of copper atoms in tantalum layer

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Characterization

Method Nanomaterial Variant Source
transmission electron microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. MUUk3Hc5K
  2. 9XA8BJ
  3. X2DXcm
Product

annealed Cu/Ta/Si stack

Thickness: ~ 20 nm

Thickness: ~ 400 nm

Medium: none

Support: silicon

References

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