Loading ...

SiO2 master mold

Based on

1 Articles
2011 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
2

trichloro(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane

(tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-tricholorosilane (1H,1H,2H,2Htetrahydrotridecafluorooctyl)-trichlorosilane tridecafluoro, 1, 1,2,2-tetrahydrooctyl-1-trichlorosilane (tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane tridecafluoro-1,1,2,2(tetrahydrooctyl)trichlorosilane tridecafluoro-1,1,2,2-tetrahydrooctyl)trichlorosilane (1H,1H,2H,2H-tridecafluorooctyl)-trichlorosilane trichloro(1H, 1H, 2H, 2H-perfluorooctyl)silane trichloro[1H-,1H-,2H-,2H-perfluorooctyl]silane (1H,1H,2H,2H)-perfluorooctyl-trichlorosilane (1H,1H,2H,2H-perfluorooctyl)-trichlorosilane trichloro(1H,1H,2H,2H-perfluorooctyl) silane trichloro-(1H,1H,2H,2H-perfluorooctyl)silane (1H,1H,2H,2H)-perfluorooctyltrichlorosilane 1H,1H,2H,2H-perfluorooctyl- trichlorosilane trichloro(1H,1H,2H,2H-perfluorooctyl)silane 1H,1H,2H,2H-perfluorooctyl-trichlorosilane 1H,1H,2H,2H-perfluorooctyltrichlorosilane perfluorohexylethyltrichlorosilane perfluorooctyl trichlorosilane perfluorooctyltrichlorosilane PFOCTS PFOTS FOTS PFTS PFOS TPOS 13F FTS PFS
Type Single Compound
Formula C8H4Cl3F13Si
Role layer

Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

More information available to subscribers only.

Or, view sample content

Characterization

Method Nanomaterial Variant Source
field emission scanning electron microscopy

More information available to subscribers only.

Or, view sample content

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  1. U6mbxaUW8AZiy1HQZicdhGAo3jJA4ih1o5NsAsEDyAQ7Z5O1kDCmiq1
Product

SiO2 master mold

Line height: ~ 20 - ~ 170 nm

Line width: ~ 30 - ~ 100 nm

Pattern periodicity: ~ 170 - ~ 200 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • silicon dioxide
  • trichloro(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl)silane
Product

SiO2 master mold

Line height: ~ 20 - ~ 170 nm

Line width: ~ 30 - ~ 100 nm

Pattern periodicity: ~ 170 - ~ 200 nm

Medium/Support: none

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial