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TiO2 film

Based on

245 Articles
6 Patents
2018 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

amorphous titanium(IV) oxide

amorphous titanium dioxide amorphous titania a-titania a-TiO2
Type Single Compound
Formula TiO2
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
band gap

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optical band gap energy
porosity
refractive index
water contact angle
work function

Catalytic properties

Reaction Value Nanomaterial Variant Source
ethanol decomposition under UV light irradiation

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Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for NO2

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Applications

Area Application Nanomaterial Variant Source
catalysis

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coatings
electrodes/electrolytes
electronics
optoelectronics
power generation

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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field emission scanning electron microscopy
infrared spectroscopy
other
photoemission spectroscopy
Raman spectroscopy
scanning electron microscopy
transmission electron microscopy
UV
UV photoelectron spectroscopy
UV-Vis reflectance spectroscopy
UV-Vis spectroscopy
X-ray diffraction
X-ray photoelectron spectroscopy

Biological effects

Biological system Test details Nanomaterial Variant Source
Escherichia coli

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • titanium tetrachloride
  • water
  • amorphous silicon dioxide
  1. 8trm3m
  2. 03PDtgNgpXI71QZkzqGJ9
Product

TiO2 film

Thickness: 51.9 nm

Medium: none

Support: amorphous silicon dioxide

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Si/SiO2
  1. JS1pu
  2. 31HQcr
  3. x5j6cChfEmyilCgC
Product

TiO2 film

Thickness: ~ 2.8 nm

Medium: none

Support: Si/SiO2

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Si/SiO2
  1. Dc2sN
  2. B4DBRr
  3. 764Lw72ag2VHwMcd
Product

TiO2 film

Thickness: ~ 2.4 nm

Medium: none

Support: Si/SiO2

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Si/SiO2
  1. oanFp
  2. gUNP4O
  3. lIWepxYwrYszIUFS
Product

TiO2 film

Thickness: ~ 1.0 nm

Medium: none

Support: Si/SiO2

Method 5

Type: Physical formation
Source:
Starting materials
  • titanium(IV) oxide
  1. q5ClxFed4vB2XyvV
  2. BeTt
Product

TiO2 film

Thickness: ~ 100 nm

Medium/Support: none

References

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