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metal oxide semiconductor capacitor

Based on

1 Articles
2013 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

aluminium

aluminum
Type Single Compound
Formula Al
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

trichloro(3,3,3-trifluoropropyl)-silane

trichloro(3,3,3-trifluoropropyl)silane 3,3,3-trifluoropropyltrichlorosilane trichloro trifluoro propyl silane fluorochlorosilane TFPS TTPS
Type Single Compound
Formula Cl3SiCH2CH2CF3
Role layer
4

aluminium

aluminum
Type Single Compound
Formula Al
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
flat-band voltage

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • oxygen
Product

metal oxide semiconductor capacitor

Thickness: 15 - 55 nm

Thickness: 300 nm

Thickness: 40 nm

Medium: none

Support: silicon

References

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