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In2O3/Li-ZnO heterojunction bottom-gate top-contact thin film transistor

Based on

1 Articles
2017 Most recent source

Composition

1

heavily-doped silicon

Si++
Type Complex Compound
Formula
Role gate
2

hydroxylated silica

hydroxylated SiO2
Type Complex Compound
Formula
Role gate dielectrics
3

In2O3/Li-doped ZnO heterojunction

In2O3/Li-ZnO heterojunction In2O3/Li-ZnO bilayer
Type Nano Material
Formula
Role semiconductor layer
4

aluminium

aluminum
Type Single Compound
Formula Al
Role source
5

aluminium

aluminum
Type Single Compound
Formula Al
Role drain

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
charge carrier concentration

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Applications

Area Application Nanomaterial Variant Source
electronics

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. XzmoPzun
Product

In2O3/Li-ZnO heterojunction bottom-gate top-contact thin film transistor

Size: not specified

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. iTdasyEC
Product

In2O3/Li-ZnO heterojunction bottom-gate top-contact thin film transistor

Size: not specified

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. bNghGUWO
Product

In2O3/Li-ZnO heterojunction bottom-gate top-contact thin film transistor

Size: not specified

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. ovswmQWQ
Product

In2O3/Li-ZnO heterojunction bottom-gate top-contact thin film transistor

Size: not specified

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. tcwPtFh3
Product

In2O3/Li-ZnO heterojunction bottom-gate top-contact thin film transistor

Size: not specified

Medium/Support: none

References

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