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plasmonic silicon optoelectronic device

Based on

1 Articles
2016 Most recent source

Composition

1

aluminium

aluminum
Type Single Compound
Formula Al
Role cathode
2

n-doped silicon

n-Si
Type Complex Compound
Formula
Role substrate
3

silicon dioxide

silicic oxide silica
Type
Formula SiO2
Role
4

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role anode
5

aluminium nanodisks

Al nanodisks
Type Nano Material
Formula
Role plasmonic scattering layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
CIE color parameters

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Applications

Area Application Nanomaterial Variant Source
optoelectronics

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Characterization

Method Nanomaterial Variant Source
optical microscopy

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • tin-doped indium oxide
  • n-doped silicon
Product

plasmonic silicon optoelectronic device

Size: not specified

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • tin-doped indium oxide
  • n-doped silicon
Product

plasmonic silicon optoelectronic device

Size: not specified

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • tin-doped indium oxide
  • n-doped silicon
Product

plasmonic silicon optoelectronic device

Size: not specified

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • tin-doped indium oxide
  • n-doped silicon
Product

plasmonic silicon optoelectronic device

Size: not specified

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • tin-doped indium oxide
  • n-doped silicon
Product

plasmonic silicon optoelectronic device

Size: not specified

Medium/Support: none

References

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