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In2O3 TFT

Based on

2 Articles
2016 Most recent source

Composition

1

p-doped silicon

p-doped Si silicon p-Si
Type Single Compound
Formula Si
Role gate
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role gate dielectrics
3

indium oxide film

In2O3 film
Type Nano Material
Formula
Role channel layer
4

aluminium

aluminum
Type Single Compound
Formula Al
Role source
5

aluminium

aluminum
Type Single Compound
Formula Al
Role drain

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
drain current

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Applications

Area Application Nanomaterial Variant Source
electronics

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica
  1. iPZUu
  2. o1ofSgnwJTxgsOv
  3. 5KmqeN
Product

In2O3 TFT

Size: not specified

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica
  1. IGfdf
  2. JGbZYWolzL5O1Ms
  3. 849Gem
Product

In2O3 TFT

Size: not specified

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica
  1. Uf5GV
  2. 19RtqwpgnQUhPxs
  3. prTj9e
Product

In2O3 TFT

Size: not specified

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica
  1. zYGjw
  2. cFQY0l1Sb8WNvzC
  3. kdYaNI
Product

In2O3 TFT

Size: not specified

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • silicon/silica
  1. pAaPu
  2. 9jEHxTA8uchiKKn
  3. pfS72O
Product

In2O3 TFT

Size: not specified

Medium/Support: none

References

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