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fullerene-based bottom-gate top-contact thin film transistor

Based on

1 Articles
2014 Most recent source

Composition

1

Si++

Type Complex Compound
Formula
Role gate
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role gate dielectrics
3

divinyltetramethyldisiloxane bis(benzocyclobutene) monomer

divinyltetramethyldisiloxane bis(benzocyclobutene) divinyltetramethyldisiloxane-bis(benzocyclobutene) divinyl-tetramethylsiloxane-bis(benzocyclobutene) divinylsiloxane-bis-benzocyclobutene divinylsiloxane-bisbenzocyclobutene BCB 3022-46 BCB monomer BCB
Type Single Compound
Formula C24H30OSi2
Role surface protecting layer
4

C70 film

Type Nano Material
Formula
Role channels
5

aluminium

aluminum
Type Single Compound
Formula Al
Role source
6

aluminium

aluminum
Type Single Compound
Formula Al
Role drain

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
channel current on-off ratio

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Applications

Area Application Nanomaterial Variant Source
electronics

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Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • divinyltetramethyldisiloxane bis(benzocyclobutene) monomer
  • Si++/SiO2
  1. dufYtlrTsuUSgRxVrFto1B4Ph4g
Product

fullerene-based bottom-gate top-contact thin film transistor

Size: not specified

Medium/Support: none

References

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