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charge-trap flash-memory oxide thin film transistor

Based on

1 Articles
2014 Most recent source

Composition

1

n-doped Si

Type Complex Compound
Formula
Role gate
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role current blocking layer
3

10 mol% Cu-doped ZrO2

Type Complex Compound
Formula
Role charge-trapping layer
4

zirconium(IV) oxide

zirconium dioxide zirconia
Type Single Compound
Formula ZrO2
Role tunneling layer
5

indium sesquioxide

indium(III) oxide indium trioxide indium oxide
Type Single Compound
Formula In2O3
Role conducting channel
6

aluminium

aluminum
Type Single Compound
Formula Al
Role source
7

aluminium

aluminum
Type Single Compound
Formula Al
Role drain

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
drain current

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Applications

Area Application Nanomaterial Variant Source
data storage

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • copper(II) nitrate hydrate
  • n-doped Si/SiO2
  • zirconyl nitrate hydrate
  1. DS24zz2rVh9vF00JjclZ0asKh
Product

charge-trap flash-memory oxide thin film transistor

Size: not specified

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • copper(II) nitrate hydrate
  • n-doped Si/SiO2
  • zirconyl nitrate hydrate
  1. 5MwT0y8l9v8quia1IzALLSHFx
Product

charge-trap flash-memory oxide thin film transistor

Size: not specified

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • copper(II) nitrate hydrate
  • n-doped Si/SiO2
  • zirconyl nitrate hydrate
  1. e0PI5LtYwIyBSVkr00vShZGqJ
Product

charge-trap flash-memory oxide thin film transistor

Size: not specified

Medium/Support: none

References

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