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TiN/Hf0.57Zr0.43O2 film on oxidized Si

Based on

1 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

titanium nitride

Type Single Compound
Formula TiN
Role layer
2

Hf0.57Zr0.43O2

Type Single Compound
Formula Hf0.57Zr0.43O2
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
polarization

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Applications

Characterization

Method Nanomaterial Variant Source
grazing incidence X-ray and neutron diffraction

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
See all (4)
Product

TiN/Hf0.57Zr0.43O2 film on oxidized Si

Grain radius: ~ 2 - ~ 20 nm

Thickness: 14.2 nm

Thickness: 50 nm

Medium: none

Support: oxidized silicon

Method 2

Type: Chemical synthesis
Source:
Starting materials
See all (4)
Product

TiN/Hf0.57Zr0.43O2 film on oxidized Si

Grain radius: ~ 2 - ~ 20 nm

Thickness: 14.2 nm

Thickness: 50 nm

Medium: none

Support: oxidized silicon

Method 3

Type: Chemical synthesis
Source:
Starting materials
See all (4)
Product

TiN/Hf0.57Zr0.43O2 film on oxidized Si

Grain radius: ~ 2 - ~ 22 nm

Thickness: 19.2 nm

Thickness: 50 nm

Medium: none

Support: oxidized silicon

Method 4

Type: Chemical synthesis
Source:
Starting materials
See all (4)
Product

TiN/Hf0.57Zr0.43O2 film on oxidized Si

Grain radius: ~ 2 - ~ 22 nm

Thickness: 19.2 nm

Thickness: 50 nm

Medium: none

Support: oxidized silicon

Method 5

Type: Chemical synthesis
Source:
Starting materials
See all (4)
Product

TiN/Hf0.57Zr0.43O2 film on oxidized Si

Grain radius: ~ 2 - ~ 20 nm

Thickness: 14.2 nm

Thickness: 50 nm

Medium: none

Support: oxidized silicon

References

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