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SiO2-coated I-UVP nanoimprint resist polymer nanofingers collapsed dimers array

Based on

1 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

I-UVP nanoimprint resist polymer nanofingers array

flexible polymer nanofingers array
Type Nano Material
Formula
Role core
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
longitudinal bonding dipole plasmon (LBDP)

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Applications

Area Application Nanomaterial Variant Source
diagnostics

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Characterization

Method Nanomaterial Variant Source
UV

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
  1. 3yq4Cit
Product

SiO2-coated I-UVP nanoimprint resist polymer nanofingers collapsed dimers array

Diameter: 60 nm

Dimer nanogap size: 1 nm

Length: 350 nm

Thickness: 0.5 nm

Medium: none

Support: UV nanoimprint resist

Method 2

Type: Physical formation
Source:
  1. YYMEyz9
Product

SiO2-coated I-UVP nanoimprint resist polymer nanofingers collapsed dimers array

Diameter: 60 nm

Dimer nanogap size: 1.5 nm

Length: 350 nm

Thickness: 0.75 nm

Medium: none

Support: UV nanoimprint resist

Method 3

Type: Physical formation
Source:
  1. hHDx1IZ
Product

SiO2-coated I-UVP nanoimprint resist polymer nanofingers collapsed dimers array

Diameter: 60 nm

Dimer nanogap size: ~ 3.2 nm

Length: 350 nm

Thickness: ~ 1.6 nm

Medium: none

Support: UV nanoimprint resist

Method 4

Type: Physical formation
Source:
  1. fiKwmQS
Product

SiO2-coated I-UVP nanoimprint resist polymer nanofingers collapsed dimers array

Diameter: 60 nm

Dimer nanogap size: 6 nm

Length: 350 nm

Thickness: 3 nm

Medium: none

Support: UV nanoimprint resist

Method 5

Type: Physical formation
Source:
  1. Okzs2Ck
Product

SiO2-coated I-UVP nanoimprint resist polymer nanofingers collapsed dimers array

Diameter: 60 nm

Dimer nanogap size: ~ 2.2 nm

Length: 350 nm

Thickness: ~ 1.1 nm

Medium: none

Support: UV nanoimprint resist

References

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