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patterned poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate) film

Based on

3 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate)

PMMAZO
Type Polymer
Formula
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
optoelectronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • silicon
Product

patterned poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate) film

Thickness: ~ 4.5 nm

Medium: none

Support: silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate)
  • Si wafer
  1. CEniy9d
Product

patterned poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate) film

Continuous stripe width: 500 nm

Disjointed stripe width: 500 nm

Gap between continuous stripe and disjointed stripes: 50 nm

Thickness: ~ 4 nm

Medium: none

Support: Si wafer

Method 3

Type: Physical formation
Source:
Starting materials
  • poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate)
  • Si wafer
  1. WzPcEzs
Product

patterned poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate) film

Continuous stripe width: 900 nm

Disjointed stripe width: 500 nm

Gap between continuous stripe and disjointed stripes: 50 nm

Thickness: ~ 4 nm

Medium: none

Support: Si wafer

Method 4

Type: Physical formation
Source:
Starting materials
  • silicon
Product

patterned poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate) film

Thickness: ~ 4.5 nm

Medium: none

Support: silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • silicon
Product

patterned poly(6-(4-methoxyazobenzene-4'-oxy)hexyl methacrylate) film

Thickness: ~ 4.5 nm

Medium: none

Support: silicon

References

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