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Si/SiO2/Ta/Ru/Ta/Co20Fe60B20/GdOx/Co20Fe60B20/Ta/Ru film

Based on

1 Articles
2017 Most recent source

Composition

1

silicon

Type Single Compound
Formula Si
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

tantalum

Type Single Compound
Formula Ta
Role layer
4

ruthenium

Type Single Compound
Formula Ru
Role layer
5

tantalum

Type Single Compound
Formula Ta
Role layer
6

Co20Fe60B20

Type Single Compound
Formula Co20Fe60B20
Role layer
7

gadolinium oxide

Type Single Compound
Formula GdO(x)
Role layer
8

Co20Fe60B20

Type Single Compound
Formula Co20Fe60B20
Role layer
9

tantalum

Type Single Compound
Formula Ta
Role layer
10

ruthenium

Type Single Compound
Formula Ru
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
anisotropy field

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Applications

Area Application Nanomaterial Variant Source
magnetic materials

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Characterization

Method Nanomaterial Variant Source
STEM-HAADF

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • tantalum
  1. 4JYsHt
Product

Si/SiO2/Ta/Ru/Ta/Co20Fe60B20/GdOx/Co20Fe60B20/Ta/Ru film

Thickness: 0.7 - 0.9 nm

Thickness: 1.5 - 1.6 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 7 nm

Thickness: 8 nm

Thickness: ~ 2.9 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • tantalum
  1. SK3kIf
Product

Si/SiO2/Ta/Ru/Ta/Co20Fe60B20/GdOx/Co20Fe60B20/Ta/Ru film

Thickness: 1 - 3.5 nm

Thickness: 1.5 - 1.6 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 7 nm

Thickness: 8 nm

Thickness: ~ 1.25 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • tantalum
  1. sSHhpM
Product

Si/SiO2/Ta/Ru/Ta/Co20Fe60B20/GdOx/Co20Fe60B20/Ta/Ru film

Thickness: 0.7 - 0.9 nm

Thickness: 1.5 - 1.6 nm

Thickness: 10 nm

Thickness: 2.6 nm

Thickness: 20 nm

Thickness: 7 nm

Thickness: 8 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • tantalum
  1. rUARqX
Product

Si/SiO2/Ta/Ru/Ta/Co20Fe60B20/GdOx/Co20Fe60B20/Ta/Ru film

Thickness: 0.7 - 0.9 nm

Thickness: 1.5 - 1.6 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 7 nm

Thickness: 8 nm

Thickness: ~ 1.7 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • SiO2/Si
  • tantalum
  1. xrTuTa
Product

Si/SiO2/Ta/Ru/Ta/Co20Fe60B20/GdOx/Co20Fe60B20/Ta/Ru film

Thickness: 0.7 - 0.9 nm

Thickness: 1.5 - 1.6 nm

Thickness: 10 nm

Thickness: 20 nm

Thickness: 3.3 nm

Thickness: 7 nm

Thickness: 8 nm

Medium/Support: none

References

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