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Ni/NixIn0.53Ga0.47As/In0.53Ga0.47As/HfO2/SiO2/NiSix

Based on

1 Articles
2017 Most recent source

Composition

1

nickel silicide

Ni silicide
Type Single Compound
Formula NiSi(x)
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

hafnium(IV) oxide

hafnium dioxide hafnium oxide hafnia
Type Single Compound
Formula HfO2
Role layer
4

indium gallium arsenide

Type Single Compound
Formula In0.53Ga0.47As
Role layer
5

amorphous nickel indium gallium arsenide

Type Single Compound
Formula Ni(x)In0.53Ga0.47As
Role layer
6

nickel

Type Single Compound
Formula Ni
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
high-resolution transmission electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
Product

Ni/NixIn0.53Ga0.47As/In0.53Ga0.47As/HfO2/SiO2/NiSix

Thickness: 100 nm

Thickness: 15 nm

Thickness: 2.96 - 4.58 nm

Thickness: 200 nm

Thickness: ~ 200 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
Product

Ni/NixIn0.53Ga0.47As/In0.53Ga0.47As/HfO2/SiO2/NiSix

Thickness: 100 nm

Thickness: 15 nm

Thickness: 200 nm

Thickness: 3.49 - 4.11 nm

Thickness: ~ 200 nm

Medium/Support: none

References

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