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FeSx film

Based on

1 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

iron sulfide

Type Single Compound
Formula FeS(x)
Role raw materials

Properties

Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  • bis(N,N'-di-tert-butylacetamidinato)iron(II)
  1. lOxa5
  2. 28xUzi7gO
  3. wQwR5woTeYrFQWJsrhLxCg7
Product

FeSx film

RMS roughness: ~ 8.6 nm

Thickness: ~ 20 nm

Medium: none

Support: Si wafer

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  • bis(N,N'-di-tert-butylacetamidinato)iron(II)
  1. xO4zn
  2. ik4q0uqIC
  3. ExGwa33VOiGImLi7iq3xs6P
Product

FeSx film

Thickness: ~ 20 nm

Medium: none

Support: Si wafer

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  • bis(N,N'-di-tert-butylacetamidinato)iron(II)
  1. REHm6
  2. l3Uwykgyj
  3. PHHrKuw9YpLlHOJKDRkIVvy
Product

FeSx film

RMS roughness: ~ 2.1 nm

Thickness: ~ 20 nm

Medium: none

Support: Si wafer

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  • bis(N,N'-di-tert-butylacetamidinato)iron(II)
  1. v3Iv6
  2. UkIw6BW6q
  3. IbiUKjvqvAJo0KRh8p7sxGt
Product

FeSx film

RMS roughness: ~ 2.4 nm

Thickness: ~ 20 nm

Medium: none

Support: Si wafer

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Si wafer
  • bis(N,N'-di-tert-butylacetamidinato)iron(II)
  1. fpIvJ
  2. E9Z5NbCq3
  3. muIsaH7t6T2S1Y6pc9JiSg9
Product

FeSx film

RMS roughness: ~ 2.1 nm

Thickness: ~ 20 nm

Medium: none

Support: Si wafer

References

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