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IIDDT-C3 polymer film on HMDS-treated SiO2

Based on

1 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

IIDDT-C3

Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
hole mobility

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Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. emmLD23HCWp5YKAoe6d
  2. NlXozHqUUimscprlaaN9b7Bftua7g
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Fibril length: ~ 1000 nm

Fibril width: ~ 30 nm

Thickness: 8.14 nm

Medium: none

Support: hexamethyldisilazane-treated SiO2

Method 2

Type: Physical formation
Source:
Starting materials
  • hexamethyldisilazane-treated SiO2
  • IIDDT-C3
  1. ebpwgwjzCmjbUwxqjHk
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Roughness: 1.4 nm

Thickness: 3.3 nm

Medium: none

Support: hexamethyldisilazane-treated SiO2

Method 3

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. g6WV2GmMGsbQQGlYXJg
  2. Km6O9kxv0WMc1aQsE8ty7TrEoBxq8
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Roughness: 1.4 nm

Medium: none

Support: poly(methyl methacrylate)-coated SiO2

Method 4

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. eMe30ZCTg2CQtaumPQq
  2. E4c2a8DMTHRhmS1FgvsTVSzyfvzqv
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Fibril length: ~ 1000 nm

Fibril width: ~ 30 nm

Thickness: 4.74 nm

Medium: none

Support: hexamethyldisilazane-treated SiO2

Method 5

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. zcSwwMCwi2RPpfctebf
  2. MDJbOA5R7U0aUPYsw0ZmVMKf18HDV
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Roughness: 1.8 nm

Thickness: 10.8 nm

Medium: none

Support: octadecyltrichlorosilane-treated SiO2

References

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