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IIDDT-C3 polymer film on HMDS-treated SiO2

Based on

1 Articles
2017 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

IIDDT-C3

Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
hole mobility

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Applications

Area Application Nanomaterial Variant Source
electronics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • hexamethyldisilazane-treated SiO2
  • IIDDT-C3
  1. uTmWMm7Q7XvvbeP861j
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Thickness: 2.6 nm

Medium: none

Support: hexamethyldisilazane-treated SiO2

Method 2

Type: Physical formation
Source:
Starting materials
  • octadecyltrichlorosilane-treated SiO2
  • IIDDT-C3
  1. Uu7tj9AnrqPgZnBzFYB
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Roughness: 1.3 nm

Thickness: 3.3 nm

Medium: none

Support: octadecyltrichlorosilane-treated SiO2

Method 3

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. 56uFrobA2S6amWvf8Aa
  2. IkZDJsSg3FCiN0xHvOJk5NrH6J8v0
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Fibril length: ~ 1000 nm

Fibril width: ~ 30 nm

Thickness: 4.74 nm

Medium: none

Support: hexamethyldisilazane-treated SiO2

Method 4

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. X54HBgidggzQDO9AwwY
  2. iNgHnPYPjPSGaQAJj6WqhBl2e65y3
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Roughness: 1.7 nm

Thickness: 12 nm

Medium: none

Support: octadecyltrichlorosilane-treated SiO2

Method 5

Type: Physical formation
Source:
Starting materials
  • IIDDT-C3
  1. MitTQeKy3LKw28Z6KmP
  2. QAQQyr4bElsG9ixZc1bwFG4o4wp8w
Product

IIDDT-C3 polymer film on HMDS-treated SiO2

Fibril length: ~ 1000 nm

Fibril width: ~ 30 nm

Thickness: 9.28 nm

Medium: none

Support: hexamethyldisilazane-treated SiO2

References

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