Loading ...

Fast insight into nanotechnology

Access easily searchable nanoscience data, synthesis methods and literature

PTB7:DPPEZnP-TEH:PC71BM ternary blend film

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

PTB7:DPPEZnP-TEH:PC71BM mixture

Type Complex Compound
Formula
Role raw materials

Properties

Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

More information/entries available to subscribers only.

Or, view sample content

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • 1,8-diiodooctane
  • DPPEZnP-TEH
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
See all (4)
  1. zz0ko6PMpVcgWzajNA9
  2. gJPPACzLkIND3p4nwdZHYfRZ7
Product

PTB7:DPPEZnP-TEH:PC71BM ternary blend film

RMS roughness: 1.21 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • 1,8-diiodooctane
  • DPPEZnP-TEH
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
See all (4)
  1. 1Omanjcf5Vpi6cb6Cnj
  2. IiVRWdIxz7ZX5DIGmlgRY3YPT
Product

PTB7:DPPEZnP-TEH:PC71BM ternary blend film

Thickness: ~ 100 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • 1,8-diiodooctane
  • DPPEZnP-TEH
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
See all (4)
  1. yQSl1hOD2EljT2NflrY
  2. K8ADZREri8klDN0WEDE2ozNNW
Product

PTB7:DPPEZnP-TEH:PC71BM ternary blend film

RMS roughness: 1.50 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
Starting materials
  • 1,8-diiodooctane
  • DPPEZnP-TEH
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
See all (4)
  1. p6dYLz5lUqstnvveZsk
  2. gGJM6fkGrYqk4OjQCgsuaYme3
Product

PTB7:DPPEZnP-TEH:PC71BM ternary blend film

Thickness: ~ 100 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
Starting materials
  • 1,8-diiodooctane
  • DPPEZnP-TEH
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
See all (4)
  1. OlzQ0pk6eZOrP0kjpXZ
  2. 08xd3wOGgDpW9VzM5jpCTYSoU
Product

PTB7:DPPEZnP-TEH:PC71BM ternary blend film

RMS roughness: 3.96 nm

Thickness: ~ 100 nm

Medium/Support: none

References

Full content is available to subscribers only

To view content please choose from the following:

We use cookies to improve your experience with our site. More information

Sign up for a free trial