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MnxGe1-x nanomesh spaced by SiO2 mask on Ge

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

SiO2 nanopillars pattern on Ge

periodic SiO2 nanopillars SiO2 nanopillar array
Type Nano Material
Formula
Role template
2

3% Mn-doped Ge

Type Single Compound
Formula Mn0.03Ge0.97
Role partial layer
3

chromium

Type Single Compound
Formula Cr
Role layer
4

gold

Type Single Compound
Formula Au
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
energy dispersive X-ray spectroscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
Product

MnxGe1-x nanomesh spaced by SiO2 mask on Ge

Height: ~ 25 nm

Thickness: ~ 50 nm

Thickness: ~ 80 nm

Medium: none

Support: germanium

References

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