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poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

poly(3-hexylthiophene):[6,6]-phenyl-C61-butyric acid methyl ester

P3HT:PCBM
Type Complex Compound
Formula
Role binder
2

hydrogen-passivated silicon nanocrystals

H-passivated Si nanocrystals H-passivated Si NC
Type Nano Material
Formula
Role fillers

Properties

Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
  1. K6PYMKoQ9CfidyU7dyekETGkzdUR
  2. pVBfoMDDH
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

Thickness: ~ 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
  1. afTQlgCqWVjG7PZrURjLHbfEWtcs
  2. RKp6sJpRs
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 3.96 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
  1. kvLBIwPZABssvFaclrrH4zYtOSWA
  2. lJRLZI2le
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 80.8 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 4

Type: Physical formation
Source:
  1. XsdOZz7HAiTuYqrMAptZDTukDkoV
  2. wM7k4Kb79
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

RMS roughness: 5.48 nm

Thickness: ~ 100 nm

Medium/Support: none

Method 5

Type: Physical formation
Source:
  1. CV0lbwdCVYcQTxCbc9cX8s3A0Pn2
  2. VhSux0trV
Product

poly(3-hexylthiophene):(hydrogen-passivated silicon nanocrystals):[6,6]-phenyl-C61-butyric acid methyl ester film

Thickness: ~ 100 nm

Medium/Support: none

References

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