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monolayer MoS2/hBN/VO2/SiO2/Si multilayer

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

vanadium(IV) oxide

vanadium dioxide vanadium oxide
Type Single Compound
Formula VO2
Role layer
2

hexagonal boron nitride

h-BN hBN
Type Single Compound
Formula BN
Role partial layer
3

monolayer molybdenum disulfide

monolayer MoS2
Type Nano Material
Formula
Role partial layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
emission

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Applications

Area Application Nanomaterial Variant Source
electronic paper

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • hexagonal boron nitride
Product

monolayer MoS2/hBN/VO2/SiO2/Si multilayer

Grain size: ~ 100 nm

Roughness: 5 - 10 nm

Thickness: 150 nm

Thickness: 9 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Physical formation
Source:
Starting materials
  • hexagonal boron nitride
Product

monolayer MoS2/hBN/VO2/SiO2/Si multilayer

Grain size: ~ 100 nm

Roughness: 5 - 10 nm

Thickness: 150 nm

Thickness: ~ 25 nm

Medium: none

Support: SiO2/Si

Method 3

Type: Physical formation
Source:
Starting materials
  • hexagonal boron nitride
Product

monolayer MoS2/hBN/VO2/SiO2/Si multilayer

Grain size: ~ 100 nm

Roughness: 5 - 10 nm

Thickness: 150 nm

Thickness: 50 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Physical formation
Source:
Starting materials
  • hexagonal boron nitride
Product

monolayer MoS2/hBN/VO2/SiO2/Si multilayer

Grain size: ~ 100 nm

Roughness: 5 - 10 nm

Thickness: 150 nm

Thickness: 32 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Physical formation
Source:
Starting materials
  • hexagonal boron nitride
Product

monolayer MoS2/hBN/VO2/SiO2/Si multilayer

Grain size: ~ 100 nm

Roughness: 5 - 10 nm

Thickness: 150 nm

Thickness: ~ 12 nm

Medium: none

Support: SiO2/Si

References

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