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metallic slit array/SiNx/ITO/a-Si structure

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

amorphous silicon

amorphous Si a-Si:H a-Si aSi
Type Single Compound
Formula Si
Role layer
2

tin-doped indium oxide

indium tin oxide ITO
Type Complex Compound
Formula
Role layer
3

silicon-rich silicon nitride

Si-reached silicon nitride silicon nitride a-SiNx SRSN
Type Single Compound
Formula SiN(x)
Role layer
4

titanium

Type Single Compound
Formula Ti
Role layer
5

gold

Type Single Compound
Formula Au
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
infrared spectroscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. uyhd
Product

metallic slit array/SiNx/ITO/a-Si structure

Thickness: 2000 nm

Thickness: 3 nm

Thickness: 4 nm

Thickness: 60 nm

Thickness: 80 nm

Medium/Support: none

References

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