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poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]:[6,6]-phenyl-C71-butyric acid methyl ester blend film

Based on

1 Articles
2016 Most recent source

Composition

1

poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]

PPDT2FBT
Type Polymer
Formula
Role raw materials
2

3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester

[6,6]-phenyl C71 butyric acid methyl ester [6,6]-phenyl-C71-butyric acid methyl ester (6,6)-phenyl-C71-butyric acid methyl ester [70]PCBM PC71BM PC71BM
Type Single Compound
Formula C82H14O2
Role raw materials

Properties

Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. q7sxR0P8n9fHB9f8v3ZWUslflHAq2HSPFxr8R
  2. iCPm0RGD6lbbH5h6c6O
  3. YB8ix59Uv0oMnT7ASh2rDVxfmQkiNSuRxf05wWp
Product

poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]:[6,6]-phenyl-C71-butyric acid methyl ester blend film

RMS roughness: 1.63 nm

Thickness: 45 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. wTcyL6ydiIacaRv06Bd6EcSHYhA07tYvCqBYT
  2. yaAxBbqrnVrL2IpGpAp
  3. uoC1gyU0uREj7kmHh6MMWbMSNCucYZep7
Product

poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]:[6,6]-phenyl-C71-butyric acid methyl ester blend film

RMS roughness: 2.08 nm

Thickness: 40 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]
  • 3'-phenyl-3'H-cyclopropa[8,25][5,6]fullerene-C70-D5h(6)-3'-butanoic acid, methyl ester
  1. nzkloSKNFfOzQlMUCRhyP7FQouG6EpoxhHFie
  2. jfq9w25YToLbstp9GAT
  3. bPpjPgw8r2aFquJCha5q6FYze14BD46f8kzifvG
Product

poly[(2,5-bis(2-hexyldecyloxy)phenylene)-alt-(5,6-difluoro-4,7-di(thiophen-2-yl)benzo[c][1,2,5]thiadiazole)]:[6,6]-phenyl-C71-butyric acid methyl ester blend film

RMS roughness: 2.34 nm

Thickness: 100 nm

Medium/Support: none

References

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