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Ta/Cu/Co40Fe40B20/Cu/Ta film on Si/SiO2

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

tantalum

Type Single Compound
Formula Ta
Role layer
2

copper

Type Single Compound
Formula Cu
Role layer
3

cobalt-iron-boron alloy

cobalt iron boron alloy CoFeB
Type Single Compound
Formula Co40Fe40B20
Role layer
4

copper

Type Single Compound
Formula Cu
Role layer
5

tantalum

Type Single Compound
Formula Ta
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
Gilbert damping parameter dependent on spin wave mode excitation number

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Applications

Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • tantalum
  • Si wafer
  1. GketZK
Product

Ta/Cu/Co40Fe40B20/Cu/Ta film on Si/SiO2

Thickness: 5 nm

Thickness: ~ 200 nm

Medium: none

Support: Si wafer

References

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