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p+-Si//Ni film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

boron p-doped silicon

boron-doped silicon
Type Complex Compound
Formula
Role raw materials
2

polycrystalline Ni foil

nickel
Type Single Compound
Formula Ni
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
current density

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Catalytic properties

Reaction Value Nanomaterial Variant Source
oxygen evolution reaction (OER)

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Applications

Area Application Nanomaterial Variant Source
catalysis

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • phosphorus-doped silicon
  1. VdVUfjgiCxEz1tRg3Qx8
Product

p+-Si//Ni film

Diameter: 3000 nm

Pitch: 7000 nm

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  • boron p-doped silicon
  • polycrystalline Ni foil
Product

p+-Si//Ni film

Thickness: 100 nm

Medium/Support: none

References

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