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patterned photopolymer

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

AZ 9245 photoresist

photopolymer
Type Polymer
Formula
Role raw materials
2

poly(vinyl alcohol) phase mask

PVA phase mask
Type Nano Material
Formula
Role imprint/shape

Properties

Applications

Area Application Source
raw materials/precursors/templates

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Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • AZ 9245 photoresist
  1. rhun4MMdsiMNec
  2. 9IfZuBmLzE
  3. pGiZsgiY5rErPOrhGHzZIdS
Product

patterned photopolymer

References

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