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SiOx ultrathin film

Based on

2 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

SiOx

Type Complex Compound
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
elastic modulus

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Biological system Test details Nanomaterial Variant Source
Escherichia coli DSM 1576

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • Poly(ether ether ketone)
  • oxygen
  1. gDpuvFePd
  2. ygd70
  3. M4ozlYPEhRTqwubmYeiQW4yg
  4. sBM3nh
  5. 4Ur7CVZh18IgPemLl0onyQ5uwVB
Product

SiOx ultrathin film

Lateral correlation length: 210 - 1250 nm

RMS roughness: 7.90 - 25.55 nm

Thickness: 23 - 29 nm

Medium: none

Support: Poly(ether ether ketone)

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • silicon dioxide
  • silicon
Product

SiOx ultrathin film

Thickness: 37 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • oxygen
  1. DCneSpkpR
  2. jnMpO
  3. HfyCrp9rVN2wepiM6bbJIV62
  4. 4IKKiC
  5. r6AGDdOTWhF6vJpyE56mahqgNjs
Product

SiOx ultrathin film

Thickness: 23 - 29 nm

Medium: none

Support: silicon

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • glass
  • oxygen
  1. 5pPmulGBy
  2. f0RfZ
  3. 3LEtqNn7YMEtb6u4sAPB7Igb
  4. 9lqKAB
  5. RiQyHATCdoKEYI9AHYZstpvDANa
Product

SiOx ultrathin film

Lateral correlation length: 20 - 105 nm

RMS roughness: 2.60 - 2.95 nm

Thickness: 23 - 29 nm

Medium: none

Support: glass

References

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