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NiSx film

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

nickel sulfide

Type Single Compound
Formula NiS(x)
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
chronoamperogram

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Applications

Area Application Nanomaterial Variant Source
energy storage

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • ozone
Product

NiSx film

RMS roughness: 1.05 nm

Thickness: ~ 10 nm

Medium: none

Support: Si wafer

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • ozone
Product

NiSx film

RMS roughness: 2.5 nm

Thickness: ~ 10 nm

Medium: none

Support: Si wafer

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • ozone
  • glass-like carbon
Product

NiSx film

Thickness: 7.5 nm

Medium: none

Support: GC/carbon oxide

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • ozone
Product

NiSx film

Thickness: ~ 17 nm

Medium: none

Support: Si wafer

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • silicon
  • ozone
Product

NiSx film

Thickness: ~ 24 nm

Medium: none

Support: Si wafer

References

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