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self-assembled poly(styrene-block-methyl methacrylate)/patterned cured hydrogen silsesquioxane/cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)/silicon-containing anti-reflective coating/organic transfer layer HM 8500

Based on

1 Articles
2014 Most recent source

Composition

1

organic transfer layer HM 8500

Type Complex Compound
Formula
Role layer
2

silicon-containing anti-reflective coating

SHB-A940
Type Complex Compound
Formula
Role layer
3

cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)

Type Polymer
Formula
Role layer
4

cured hydrogen silsesquioxane

cured HSQ
Type Polymer
Formula
Role partial layer
5

poly(styrene-block-methyl methacrylate)

PS-b-PMMA
Type Polymer
Formula
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
field emission scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
  1. zf7CjtmNM9JhSGPOwNX1m7rCVdMefcaoC6xScIwbFZq24k
Product

self-assembled poly(styrene-block-methyl methacrylate)/patterned cured hydrogen silsesquioxane/cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)/silicon-containing anti-reflective coating/organic transfer layer HM 8500

Circle radius: ~ 168.3 nm

Line height: 3 - 5 nm

Line width: ~ 15 nm

Periodicity: ~ 25.5 nm

Thickness: 6 nm

Thickness: ~ 40.8 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
  1. QIHsYSBQZutuNBGjLv9NRZK9mpHGMGsZCl6gnENIH62WBu
Product

self-assembled poly(styrene-block-methyl methacrylate)/patterned cured hydrogen silsesquioxane/cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)/silicon-containing anti-reflective coating/organic transfer layer HM 8500

Circle radius: ~ 168.3 nm

Line height: 3 - 5 nm

Line width: ~ 15 nm

Periodicity: ~ 25.5 nm

Thickness: 6 nm

Thickness: ~ 40.8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
  1. MajQHRsZB1N27nhQ4IpiuuMUKl9BNaKdLzzwp1xAatKkA8
Product

self-assembled poly(styrene-block-methyl methacrylate)/patterned cured hydrogen silsesquioxane/cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)/silicon-containing anti-reflective coating/organic transfer layer HM 8500

Line height: 3 - 5 nm

Line width: ~ 15 - ~ 200 nm

Periodicity: ~ 25.5 nm

Thickness: 6 nm

Thickness: ~ 30.6 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
  1. PzoMeaAz6cAt40QQkAlqcozmMczsxwJ3SX8sGnJ2HXzbRT
Product

self-assembled poly(styrene-block-methyl methacrylate)/patterned cured hydrogen silsesquioxane/cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)/silicon-containing anti-reflective coating/organic transfer layer HM 8500

Circle radius: ~ 168.3 nm

Line height: 3 - 5 nm

Line width: ~ 15 nm

Periodicity: ~ 25.5 nm

Thickness: 6 nm

Thickness: ~ 40.8 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
  1. WwUs8MKb2Vj3pAOpjwNymDteSrrLWGedDIH9S1ZkIcQGWu
Product

self-assembled poly(styrene-block-methyl methacrylate)/patterned cured hydrogen silsesquioxane/cross-linked poly(styrene-r-epoxydicyclopentadiene methacrylate)/silicon-containing anti-reflective coating/organic transfer layer HM 8500

Circle radius: ~ 168.3 nm

Line height: 3 - 5 nm

Line width: ~ 15 nm

Periodicity: ~ 25.5 nm

Thickness: 6 nm

Thickness: ~ 40.8 nm

Medium/Support: none

References

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