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nanopattern on photoresist AZ3100

Based on

1 Articles
2008 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

AZ3100 photoresist

Type Complex Compound
Formula
Role raw materials

Properties

Applications

Characterization

Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
Product

nanopattern on photoresist AZ3100

Hole size: ~ 260 nm

Thickness: 100 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
Product

nanopattern on photoresist AZ3100

Hole size: ~ 75 nm

Thickness: 100 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  • AZ3100 photoresist
  1. k3S83AXi1aeUAKYX7
Product

nanopattern on photoresist AZ3100

Thickness: 100 nm

Medium/Support: none

References

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