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BP flakes film

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon-rich silicon oxide

SiOx SRSO
Type Single Compound
Formula SiO(x)
Role layer
2

black phosphorus

phosphorus P black black P black-P b-P BP bP
Type Single Compound
Formula P
Role layer
3

substoichiometric aluminum oxide

noncrystalline aluminum oxide anodized aluminum oxide aluminium suboxide oxidized aluminium aluminium oxide aluminum oxide alumina
Type Single Compound
Formula AlO(x)
Role layer
4

NbV alloy

Type Complex Compound
Formula
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
elastic modulus

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Method Nanomaterial Variant Source
time-domain thermoreflectance

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. gegSzIo
  2. ggZKioYeShA
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 384 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 2

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. HY9HKVV
  2. ZRxgoHWPTk6
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 55 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 3

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. 9CDO65h
  2. 2R3UNUV7XQ2
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 404 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 4

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. qA86MQn
  2. ORXsrGxkCQn
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 552 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

Method 5

Type: Physical formation
Source:
Starting materials
  • phosphorous doped silicon
  • silicon-rich silicon oxide
  1. PjPP6EW
  2. oPvbRPc620k
Product

BP flakes film

Thickness: 1.8 - 2.0 nm

Thickness: 138 nm

Thickness: 70 nm

Thickness: ~ 3 nm

Medium: none

Support: phosphorous doped silicon

References

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