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nSi/SiO2/TiO2/Ir

Based on

1 Articles
2016 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

phosphorus-doped silicon

n-doped Si
Type Complex Compound
Formula
Role layer
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

titanium(IV) oxide

titanium dioxide titanium oxide titania
Type Single Compound
Formula TiO2
Role layer
4

iridium

Type Single Compound
Formula Ir
Role layer

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
current density

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Applications

Area Application Nanomaterial Variant Source
power generation

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Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped silicon
  1. nQKq5
Product

nSi/SiO2/TiO2/Ir

Thickness: 2 nm

Thickness: ~ 1.3 nm

Thickness: ~ 32 - 40 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped silicon
  1. T10V3
Product

nSi/SiO2/TiO2/Ir

Thickness: 2 nm

Thickness: ~ 1.3 nm

Thickness: ~ 8 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped silicon
  1. ifurJ
Product

nSi/SiO2/TiO2/Ir

Thickness: 2 nm

Thickness: ~ 1.3 nm

Thickness: ~ 4 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped silicon
  1. mS1co
Product

nSi/SiO2/TiO2/Ir

Thickness: 2 nm

Thickness: ~ 1.3 nm

Thickness: ~ 2 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • phosphorus-doped silicon
  1. iljyy
Product

nSi/SiO2/TiO2/Ir

Thickness: 2 nm

Thickness: ~ 1.3 nm

Thickness: ~ 16 - 20 nm

Medium/Support: none

References

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