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polydimethylsiloxane nanopatterned film

Based on

28 Articles
2017 Most recent source

Composition

1

poly(dimethylsiloxane)

polydimethylsiloxane PDMS
Type Polymer
Formula
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
blue light extraction efficiency enhancement

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Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
sensor for Influenza A (HK68) virus

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Applications

Area Application Nanomaterial Variant Source
diagnostics

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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scanning electron microscopy

Biological effects

Biological system Test details Nanomaterial Variant Source
GFP-expressing Escherichia coli

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Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard®184-curing agent
  1. e2VLNTeqHZiepUzFh5UCGr3hBiyq8xYq32rusYspSF48TxLZj8YAZZQ9PATwQLxk5Giv9sKeqbNbSP
Product

polydimethylsiloxane nanopatterned film

Trench depth: 20 - 30 nm

Trench edge length: 150 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard®184-curing agent
  1. 89pq9KrWqbweKKi1vh9huRrdc4AmzOZ2GWYuZ0HIgrsHY50O5rXsqVtdVxoTu654SOKflDariv9BMn
Product

polydimethylsiloxane nanopatterned film

Trench depth: 20 nm

Trench edge length: 180 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard®184-curing agent
  1. kNn8Vez0tV4j8xKHtRtYSRQE7uFJ9TN2fmTf1SJbr5rnMN2u3CAyLr0Q
Product

polydimethylsiloxane nanopatterned film

Trench depth: 100 nm

Trench length: 240 nm

Trench width: 170 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard®184-curing agent
  1. ZNzmESVlS0Y6JVKGIcMVp3YMkPOcfyXU8OscSvI8w8CVvFlLL1lBVeLx
Product

polydimethylsiloxane nanopatterned film

Trench depth: 30 nm

Trench length: 250 nm

Trench width: 150 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Sylgard®184-curing agent
  1. kjA9iOcaJDzVTL3lAU4l35n1dFlV2xD8GfEdMIwsRcYeTMx4r8Rq548B5Ct96bDAIKC4bS2HRGQrB3
Product

polydimethylsiloxane nanopatterned film

Trench depth: 100 nm

Trench edge length: 180 nm

Medium/Support: none

References

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