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silicon/nanopatterned buried oxide/biotin

Based on

1 Articles
2014 Most recent source

Composition

1

silicon-rich silicon oxide

SiOx SRSO
Type Single Compound
Formula SiO(x)
Role layer
2

silicon

Type Single Compound
Formula Si
Role layer
3

boron

Type Single Compound
Formula B
Role dopant
4

(3-aminopropyl)-triethoxysilane moiety

(3-aminopropyl)trimethoxysilane moiety (3-aminopropyl)triethoxysilane moiety γ-aminopropyltriethoxy silane moiety 3-aminopropyltrimethoxysilane moiety 3-aminopropyltriethoxysilane moiety γ-aminopropyltriethoxysilane moiety (3-aminopropyl)trioxysilane moiety (3-aminopropyl)silanetrioxy group 3-aminopropylsilanetrioxy group 3-aminopropylsiloxy fragment 3-aminopropyl silane moiety 3-aminopropylsilane moiety γ-APTES moiety 3-APTS moiety APTES moiety APTMS moiety AMPS moiety APTS moiety APS moiety
Type Single Compound
Formula -C3H8NO3Si-
Role layer
5

coenzyme R

coenzyme R biopeiderm vitamin H biotin
Type Single Compound
Formula C10H16N2O3S
Role layer

Properties

Sensor properties

Type of sensor Sensor property Nanomaterial Variant Source
compounds sensor for avidin

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Applications

Area Application Nanomaterial Variant Source
diagnostics

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Characterization

Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. 36
Product

silicon/nanopatterned buried oxide/biotin

Distance between holes: ~ 15 nm

Hole diameter: ~ 65 nm

Pillar width: 40 nm

Pitch: 80 nm

Thickness: 200 nm

Thickness: 22 - 28 nm

Medium/Support: none

Method 2

Type: Chemical synthesis
Source:
Starting materials
  1. 9s
Product

silicon/nanopatterned buried oxide/biotin

Distance between holes: ~ 15 nm

Hole diameter: ~ 65 nm

Pitch: 80 nm

Thickness: 200 nm

Thickness: 22 - 28 nm

Medium/Support: none

Method 3

Type: Chemical synthesis
Source:
Starting materials
  1. Ar
Product

silicon/nanopatterned buried oxide/biotin

Distance between holes: ~ 15 nm

Hole diameter: ~ 65 nm

Pillar width: 30 nm

Pitch: 80 nm

Thickness: 200 nm

Thickness: 22 - 28 nm

Medium/Support: none

Method 4

Type: Chemical synthesis
Source:
Starting materials
  1. OV
Product

silicon/nanopatterned buried oxide/biotin

Distance between holes: ~ 15 nm

Hole diameter: ~ 65 nm

Pillar width: 20 nm

Pitch: 80 nm

Thickness: 200 nm

Thickness: 22 - 28 nm

Medium/Support: none

Method 5

Type: Chemical synthesis
Source:
Starting materials
  1. oF
Product

silicon/nanopatterned buried oxide/biotin

Distance between holes: ~ 15 nm

Hole diameter: ~ 65 nm

Pillar width: 70 nm

Pitch: 80 nm

Thickness: 200 nm

Thickness: 22 - 28 nm

Medium/Support: none

References

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