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Si/Al/AlOx/TPA/Se-SQ-C4 thin film

Based on

1 Articles
2014 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

silicon

Type Single Compound
Formula Si
Role layer
2

aluminium

aluminum
Type Single Compound
Formula Al
Role layer
3

substoichiometric aluminum oxide

noncrystalline aluminum oxide anodized aluminum oxide aluminium suboxide oxidized aluminium aluminium oxide aluminum oxide alumina
Type Single Compound
Formula AlO(x)
Role layer
4

1-tetradecanephosphonic acid

n-tetradecyl phosphonic acid n-tetradecylphosphonic acid tetradecylphosphonic acid HC14-PA C14-PA TDPA TPA
Type Single Compound
Formula C14H31O3P
Role layer
5

Se-SQ-C4

Type Single Compound
Formula C31H32N4OSe2
Role layer

Properties

Applications

Characterization

Method Nanomaterial Variant Source
UV-Vis-NIR optical spectroscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • aluminium
  • Si/SiO2
Product

Si/Al/AlOx/TPA/Se-SQ-C4 thin film

Thickness: 1.7 nm

Thickness: 20 nm

Thickness: 3.6 nm

Thickness: 30 nm

Medium/Support: none

References

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