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copper seed layer on tantalum/silicon dioxide/silicon trench substrate

Based on

1 Articles
2011 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

tantalum/silicon dioxide/silicon trench substrate

Ta/SiO2/Si trench substrate
Type Nano Material
Formula
Role layer
2

copper

Type Single Compound
Formula Cu
Role layer

Properties

Applications

Area Application Source
electronics

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Characterization

Method Source
scanning electron microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  1. Raae5AXEy3BB0PbkBn
  2. 5GtcFVAeDXzkxJKtnRB9
  3. L1GhKvVOPdvCCNKPfcujQqsHJRWUiflRTChMomUXFBEX7YoU0nsFwwpCqI72WCZWB6j
  4. ojKDrfUAlqJxP1qCa6PVSNFsUYAZCCguyURMHcEiR8
  5. 4umKo
  6. J1BL1IpgzNtcONT0fd7vYXMzRxPolW
  7. 2Cu1SQIAiR6YM4t7MZrblehQMGrjKLmrOypbuzZuZvxBCeGYswkpOxS1mDQ8ZpIDsTeYKSDWSF2hK6dqA8cehevAxzHYowSlu0q2p9rMWDLJzMEMsQhFAzK79sbb6SUdQCG6mMEMRR
Product

copper seed layer on tantalum/silicon dioxide/silicon trench substrate

References

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