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resist grating structure

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

ma-N 2405 e-beam resist

Type Complex Compound
Formula
Role raw materials
2

silicon dioxide

silicic oxide silica
Type Single Compound
Formula SiO2
Role layer
3

ma-N 2405 e-beam resist

Type Complex Compound
Formula
Role layer
4

aquaSAVE electronic conductor

Type Complex Compound
Formula
Role layer

Properties

Applications

Area Application Nanomaterial Variant Source
nanoprinting/nanolithography

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Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Physical formation
Source:
Starting materials
  1. loahf
Product

resist grating structure

Line width: 250 - 290 nm

Line width: 270 - 310 nm

Thickness: 700 nm

Thickness: ~ 20 nm

Thickness: ~ 40 nm

Medium/Support: none

Method 2

Type: Physical formation
Source:
Starting materials
  1. n551V
Product

resist grating structure

Line width: 1000 - 2500 nm

Thickness: ~ 20 nm

Thickness: ~ 40 nm

Medium/Support: none

Method 3

Type: Physical formation
Source:
Starting materials
  1. 6gavp
Product

resist grating structure

Line width: 1000 - 2500 nm

Thickness: 680 nm

Thickness: ~ 20 nm

Thickness: ~ 40 nm

Medium/Support: none

References

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