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-C(CH3)=CH2 terminated microstructured Si post

Based on

1 Articles
2015 Most recent source

Composition

Image only illustrates the order and placement of components as described in literature.

1

3-(trimethoxysilyl)propyl methacrylate moiety

3-(triethoxysilyl)propyl methacrylate moiety 3-methacryloxypropyltrimethoxy silane moiety 3-(methacryloxy)propylsilanetrioxy group 3-methacryloxypropyl silane moiety γ-methacryloxypropylsilane moiety TMSPMA moiety MPTMS moiety γ-MPS moiety MPTS moiety MPS moiety
Type Single Compound
Formula -C7H11O5Si-
Role raw materials

Properties

General physical and chemical properties

Property Value Nanomaterial Variant Source
1-butyl-3-methylimidazolium tetrafluoroborate adhesion force

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Applications

Characterization

Method Nanomaterial Variant Source
atomic force microscopy

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Biological effects

Preparation

Method 1

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. SRnYMRU3HshFoaMPUZR3IgBV
Product

-C(CH3)=CH2 terminated microstructured Si post

RMS roughness: 0.45 nm

Thickness: ~ 2.1 nm

Medium: none

Support: SiO2/Si

Method 2

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. 9zs8LxuipszQnfYjc78nn9k97Skx2aG1b5Om
  2. kuUSH0mkiHJebntbU5yQXkff
Product

-C(CH3)=CH2 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 10000 nm

RMS roughness: 0.45 nm

Thickness: ~ 2.1 nm

Medium: none

Support: SiO2/Si

Method 3

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. nbjPOPPzAGARU3AlG62BHQQBvtLIxNaqTafl
  2. jPk43gE6Ld0riN736eJ8w0Oo
Product

-C(CH3)=CH2 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 30000 nm

RMS roughness: 0.45 nm

Thickness: ~ 2.1 nm

Medium: none

Support: SiO2/Si

Method 4

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. 5He7ziBB4GBC9vL7Wef5CwIXs8czkk6ebdZx
  2. 12Ajk4wMeh8Uhz3eWUQOMwTv
Product

-C(CH3)=CH2 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 20000 nm

RMS roughness: 0.45 nm

Thickness: ~ 2.1 nm

Medium: none

Support: SiO2/Si

Method 5

Type: Chemical synthesis
Source:
Starting materials
  • Piranha solution
  • silicon
  1. Ojpq4eICuG8BTFx42fOrLbvdCkB4bCCLsABN
  2. 0lj3vfCCrhWfjC7C7ccvUejq
Product

-C(CH3)=CH2 terminated microstructured Si post

Panel spacing: 5000 nm

Panel width: 2000 nm

RMS roughness: 0.45 nm

Thickness: ~ 2.1 nm

Medium: none

Support: SiO2/Si

References

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